Surface Analysis Equipments

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TOF-SIMS

PRODUCT

qtac100

High-sensitivity LEIS (static)
1st atom, In – depth ( 0 – 10 nm )
Atomic composition of the outermost atomic layer
Energy 1 – 8 keV
Lateral resolution 0.01 – 1 mm
Quantitative !!
No matrix effects

Application

- segregation,  anti-wetting,  clusters,..
- ALD growth,  high-k,  ALD-MOCVD,
- diffusion barriers,  implantation,
- M / polymer,  SAMs